Structural and optical properties of hydrogenated amorphous silicon-carbon alloys grown by plasma-enhanced chemical vapour deposition at various rf powers

By Ambrosone G.   Coscia U.  

Philosophical Magazine B, Vol. 82, Iss. 1, 2002-01 ,pp. : 35-46

Taylor & Francis Ltd

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Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

By Aguas H.   Silva V.   Ferreira I.   Fortunato E.   Martins R.  

Philosophical Magazine B, Vol. 80, Iss. 4, 2000-04 ,pp. : 475-486

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Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition

By Giorgis F.   Giuliani F.   Pirri C. F.   Tresso E.   Summonte C.   Rizzoli R.   Galloni R.   Desalvo A.   Rava P.  

Philosophical Magazine B, Vol. 77, Iss. 4, 1998-04 ,pp. : 925-944

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Ion-beam processing of hydrogenated amorphous silicon carbide grown by plasma-enhanced chemical vapour deposition

By Calcagno L.   Giorgis F.   Makhtari A.   Musumeci P.   Reitano R.  

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Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition

By Huran J.   Safrankova J.   Kobzev A.P.  

Vacuum, Vol. 50, Iss. 1, 1998-05 ,pp. : 103-105

Elsevier

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