nm-Co 2 Si, CoSi and CoSi 2 silicide films from the single source precursor CoSiCl 3 (CO) 4 in the presence of SiH 4

Author: Prokop J.   Zybill C.E.   Veprek S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.359, Iss.1, 2000-01, pp. : 39-45

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract