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Dissociation process of CH 4 /H 2 gas mixture during EACVD

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Comparative studies of TiN and Ti 1-x Al x N by plasma-assisted chemical vapor deposition using a TiCl 4 /AlCl 3 /N 2 /H 2 /Ar gas mixture

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Dust particle formation in low pressure Ar/CH 4 and Ar/C 2 H 2 discharges used for thin film deposition

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