Atomic scale models of ion implantation and dopant diffusion in silicon

Author: Theiss S.K.   Caturla M.J.   Johnson M.D.   Zhu J.   Lenosky T.   Sadigh B.   Diaz de la Rubia T.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.365, Iss.2, 2000-04, pp. : 219-230

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Abstract