Deposition of a-SiC:H thin film from organosilicon material by remote plasma CVD method

Author: Xu Y.-Y.   Muramatsu T.   Taniyama M.   Aoki T.   Hatanaka Y.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.368, Iss.2, 2000-06, pp. : 181-184

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Abstract