Author: Ding X.-z. Zhang F.-m. Wang H.-m. Chen L.-z. Liu X.-h.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.368, Iss.2, 2000-06, pp. : 257-260
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Reactive sputter deposition of titanium dioxide
Thin Solid Films, Vol. 360, Iss. 1, 2000-02 ,pp. :
Ion-beam-assisted deposition of Si-carbide films
By He Z. Inoue S. Carter G. Kheyrandish H. Colligon J.S.
Thin Solid Films, Vol. 260, Iss. 1, 1995-05 ,pp. :
Surface roughening during ion-assisted film deposition
By Carter G.
Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. :