Comparison of deposition behavior of Pb(Zr,Ti)O 3 films and its end-member-oxide films prepared by MOCVD

Author： Funakubo H. Nagashima K. Shinozaki K. Mizutani N.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.368, Iss.2, 2000-06, pp. : 261-265

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