High deposition rate a-Si:H layers from pure SiH 4 and from a 10% dilution of SiH 4 in H 2

Author： Estrada M. Cerdeira A. Pereyra I. Soto S.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.373, Iss.1, 2000-09, pp. : 176-179

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