Amorphous carbon nitride film preparation by plasma-assisted pulsed laser deposition method

By Itoh M.   Suda Y.   Bratescu M.A.   Sakai Y.   Suzuki K.  

Applied Physics A, Vol. 79, Iss. 4-6, 2004-09 ,pp. : 1575-1578

Springer Publishing Company

Access to resources Recommend Favorite

Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma

By Yoon S.F.   Ruslie   Ahn J.   Zhang Q.   Wu Y.S.   Yang H.  

Vacuum, Vol. 51, Iss. 3, 1998-11 ,pp. : 445-451

Elsevier

Access to resources Recommend Favorite

Plasma deposition of amorphous carbon films on copper

By Chiu S.   Turgeon S.   Terreaul B.   Sarkissian A.  

Thin Solid Films, Vol. 359, Iss. 2, 2000-01 ,pp. : 275-282

Elsevier

Access to resources Recommend Favorite

Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

By Lindstam M.   Boman M.   Piglmayer K.  

Thin Solid Films, Vol. 394, Iss. 1, 2001-08 ,pp. : 114-123

Elsevier

Access to resources Recommend Favorite

Deposition of polymeric nitrogenated amorphous carbon films (a-C:H:N) using electron cyclotron resonance CVD

By Yoon S.F.   Rusli   Ahn J.   Zhang Q.   Yang C.Y.   Yang H.   Watt F.  

Thin Solid Films, Vol. 340, Iss. 1, 1999-02 ,pp. : 62-67

Elsevier

Access to resources Recommend Favorite