Evaluation of precursors for chemical vapor deposition of ruthenium

Author: Smith K.C.   Sun Y.-M.   Mettlach N.R.   Hance R.L.   White J.M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.376, Iss.1, 2000-11, pp. : 73-81

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Abstract