Characteristics of Y 2 O 3 films on Si(111) grown by oxygen-ion beam-assisted deposition

Author： Cho M.-H.   Ko D.-H.   Seo J.G.   Whangbo S.W.   Jeong K.   Lyo I.W.   Whang C.N.   Noh D.Y.   Kim H.J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.382, Iss.1, 2001-02, pp. : 288-296

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