Low dielectric constant plasma polymerized methyl-cyclohexane thin films deposited by inductively coupled plasma-enhanced chemical vapor deposition

Author： Jo H.   Quan Y.C.   Jung D.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.384, Iss.1, 2001-03, pp. : 33-36

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