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Thin Solid Films, Vol. 411, Iss. 1, 2002-05 ,pp. : 166-170

Elsevier

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Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films

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Hydrogen distribution, nanostructures and optical properties of high deposition rate hot-wire CVD a-Si:H

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Influence of Phosphorus Doping in the Active Layer with Deposition Time and Gas Flow Rate in a-Si:H Thin Film Transistor

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