Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

By Liu F.   Zhu M.   Liu J.   Wang L.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 182-185

Elsevier

Access to resources Recommend Favorite

Investigation of scaling-up issues in hot-wire CVD of polycrystalline silicon

By van der Werf C.H.M.   Hardeman A.J.   van Veenendaal P.A.T.T.   van Veen M.K.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 41-45

Elsevier

Access to resources Recommend Favorite

High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament

By Povolny H.S.   Deng X.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 125-129

Elsevier

Access to resources Recommend Favorite

Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

By Saha S.C.   Guillet J.   Equer B.   Bouree J.E.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 248-252

Elsevier

Access to resources Recommend Favorite

Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD

By Ledermann A.   Weber U.   Mukherjee C.   Schroeder B.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 61-65

Elsevier

Access to resources Recommend Favorite