Author: Komoda M. Kamesaki K. Masuda A. Matsumura H.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 198-201
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Charge-trapping defects in Cat-CVD silicon nitride films
By Umeda T. Mochizuki Y. Miyoshi Y. Nashimoto Y.
Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. :
Electrical transport properties of microcrystalline silicon thin films prepared by Cat-CVD
By Liu F. Zhu M. Feng Y. Han Y. Liu J.
Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. :