Preparation of B-doped a-Si 1-x C x :H films and heterojunction p-i-n solar cells by the Cat-CVD method

By Chikusa K.   Takemoto K.   Itoh T.   Yoshida N.   Nonomura S.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 245-248

Elsevier

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Effect of r.f.-plasma assistance in hot-wire CVD on properties of c-Si:H

By Itoh T.   Inouchi H.   Ohkado K.   Chikusa K.   Nakamura N.   Kondo H.   Yoshida N.   Nonomura S.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 217-220

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Switching and filament formation in hot-wire CVD p-type a-Si:H devices

By Hu J.   Branz H.M.   Crandall R.S.   Ward S.   Wang Q.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 249-252

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The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon ( c-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

By Jadkar S.R.   Sali J.V.   Takwale M.G.   Musale D.V.   Kshirsagar S.T.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 206-212

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Development of a hot-wire chemical vapor deposition n-type emitter on p-type crystalline Si-based solar cells

By Wang Q.   Page M.R.   Xu Y.   Iwaniczko E.   Williams E.   Wang T.H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 208-211

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