The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon ( c-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

Author： Jadkar S.R.   Sali J.V.   Takwale M.G.   Musale D.V.   Kshirsagar S.T.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 206-212

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