Development of Cat-CVD apparatus for 1-m-size large-area deposition

By Ishibashi K.   Karasawa M.   Xu G.   Yokokawa N.   Ikemoto M.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 58-62

Elsevier

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Development of Cat-CVD apparatus - a method to control wafer temperatures under thermal influence of heated catalyzer

By Karasawa M.   Masuda A.   Ishibashi K.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 71-74

Elsevier

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Thin film poly-Si formation by Cat-CVD method and its application for solar cells

By Niira K.   Senta H.   Hakuma H.   Komoda M.   Okui H.   Fukui K.   Arimune H.   Shirasawa K.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 315-319

Elsevier

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A Cat-CVD Si 3 N 4 film study and its application to the ULSI process

By Uchiyama Y.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 275-279

Elsevier

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Surface chemical reactions of diamond (100) by Cat-CVD

By Song X.   Wang M.   Wang B.   Chen G.   Yan H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 257-259

Elsevier

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