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Taylor & Francis Ltd

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Effect of reactant depletion on the microstructure and preferred orientation of polycrystalline SiC films by chemical vapor deposition

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Chemical vapour deposition of polycrystalline AlN films from AlCl 3 -NH 3 mixtures: II - surface morphology and mechanisms of preferential orientation at low-pressure

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Deposition and characterisation of Nb x C 60 films

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