Thin film atomic layer deposition equipment for semiconductor processing

Author: Sneh O.   Clark-Phelps R.B.   Londergan A.R.   Winkler J.   Seidel T.E.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.402, Iss.1, 2002-01, pp. : 248-261

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Abstract