An investigation of tin oxide plasma-enhanced chemical vapor deposition using optical emission spectroscopy

Author: Robbins J.J.   Alexander R.T.   Xiao W.   Vincent T.L.   Wolden C.A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.406, Iss.1, 2002-03, pp. : 145-150

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract