Effects of nitrogen flow rates on the growth morphology of TiAlN films prepared by an rf-reactive sputtering technique

Author： Chakrabarti K. Jeong J.J. Hwang S.K. Yoo Y.C. Lee C.M.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.406, Iss.1, 2002-03, pp. : 159-163

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