Behaviors of electron and negative-ion densities in low-pressure high-density inductively coupled plasmas of SF 6 , NF 3 , CF 4 , and C 4 F 8 gases diluted with Ar

Author： Kono A.   Konishi M.   Kato K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.407, Iss.1, 2002-03, pp. : 198-203

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