Production of 1-m size uniform plasma by modified magnetron-typed RF discharge with a subsidiary electrode for resonance

By Urano Y.   Li Y.   Kanno K.   Iizuka S.   Sato N.  

Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. : 60-64

Elsevier

Access to resources Recommend Favorite

The control of the high-density microwave plasma for large-area electronics

By Shirai H.   Sakuma Y.   Ueyama H.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 12-17

Elsevier

Access to resources Recommend Favorite

Development of a large-area, multi-helicon rectangular plasma source for TFT-LCD processing

By Kim Y.J.   Han S.H.   Hwang W.   Hwang Y.S.  

Thin Solid Films, Vol. 435, Iss. 1, 2003-07 ,pp. : 270-274

Elsevier

Access to resources Recommend Favorite

Plasma diagnostic of an RF magnetron Ar/N 2 discharge

By Fritsche B.   Chevolleau T.   Kourtev J.   Kolitsch A.   Moller W.  

Vacuum, Vol. 69, Iss. 1, 2002-12 ,pp. : 139-145

Elsevier

Access to resources Recommend Favorite

Internal-antenna-driven inductive RF discharges for development of large-area high-density plasma sources with suppressed electrostatic coupling

By Miyake S.   Setsuhara Y.   Sakawa Y.   Shoji T.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 472-478

Elsevier

Access to resources Recommend Favorite