Author： Kulinich S.A. Yamamoto H. Shibata J. Terashima K. Yoshida T.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.407, Iss.1, 2002-03, pp. : 60-66
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
LiNb 1-x Ta x O 3 films prepared by thermal plasma spray CVD
By Yamamoto H. Kulinich S.A. Terashima K.
Thin Solid Films, Vol. 390, Iss. 1, 2001-06 ,pp. :
Access to resources
Recommend
High-rate deposition of LiNbO 3 films by thermal plasma spray CVD
By Yamaguchi N. Hattori T. Terashima K. Yoshida T.
Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. :
Room-temperature deposition of a-SiC:H thin films by ion-assisted plasma-enhanced CVD
Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. :