In-situ stress measurement during the ion implantation-induced doping of gallium nitride

Author： Sienz S.   Rauschenbach B.   Wenzel A.   Lell A.   Bader S.   Harle V.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.415, Iss.1, 2002-08, pp. : 1-4

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