Influence of nitrogen trifluoride and nitrogen plasma treatment on the formation of hillocks during aluminum induced crystallization of a-Si:H

Author： Al-Dhafiri A.M. El-Jammal H.A. Al-Shariah A. Naseem H.A. Brown W.D.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.422, Iss.1, 2002-12, pp. : 14-19

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