Atomic layer deposition of polycrystalline HfO 2 films by the HfI 4 -O 2 precursor combination

Author： Sundqvist J.   Harsta A.   Aarik J.   Kukli K.   Aidla A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.427, Iss.1, 2003-03, pp. : 147-151

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