Growth and microhardness of SiC films by plasma-enhanced chemical vapor deposition

By Seo J.-Y.   Yoon S.-Y.   Niihara K.   Kim K.H.  

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 138-144

Elsevier

Access to resources Recommend Favorite

a-SiC x :H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications

By Jiang L.   Chen X.   Wang X.   Xu L.   Stubhan F.   Merkel K.-H.  

Thin Solid Films, Vol. 352, Iss. 1, 1999-09 ,pp. : 97-101

Elsevier

Access to resources Recommend Favorite

Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO 2 on polymeric substrates

By Dennler G.   Houdayer A.   Latreche M.   Segui Y.   Wertheimer M.R.  

Thin Solid Films, Vol. 382, Iss. 1, 2001-02 ,pp. : 1-3

Elsevier

Access to resources Recommend Favorite

Low temperature synthesis of dense SiO 2 thin films by ion beam induced chemical vapor deposition

By Barranco A.   Yubero F.   Cotrino J.   Espinos J.P.   Bentez J.   Rojas T.C.   Allain J.   Girardeau T.   Riviere J.P.   Gonzalez-Elipe A.R.  

Thin Solid Films, Vol. 396, Iss. 1, 2001-09 ,pp. : 9-15

Elsevier

Access to resources Recommend Favorite

Plasma-enhanced chemical vapor deposition of SiO x /SiN x Bragg reflectors

By Gottschalch V.   Schmidt R.   Rheinlander B.   Pudis D.   Hardt S.   Kvietkova J.   Wagner G.   Franzheld R.  

Thin Solid Films, Vol. 416, Iss. 1, 2002-09 ,pp. : 224-232

Elsevier

Access to resources Recommend Favorite