Plasma and injection modification of the gate dielectric in MOS structures

Author: Bondarenko G.G.   Andreev V.V.   Maslovsky V.M.   Stolyarov A.A.   Drach V.E.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.427, Iss.1, 2003-03, pp. : 377-380

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Abstract