Influences of bias voltage on the crystallographic orientation of AlN thin films prepared by long-distance magnetron sputtering

Author： Chu A.K. Chao C.H. Lee F.Z. Huang H.L.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.429, Iss.1, 2003-04, pp. : 1-4

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