High-quality ZnO films prepared on Si wafers by low-pressure MO-CVD

Author: Haga K.   Suzuki T.   Kashiwaba Y.   Watanabe H.   Zhang B.P.   Segawa Y.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.433, Iss.1, 2003-06, pp. : 131-134

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Abstract