Measurements of strain during vapour deposition of thin films and multilayers

Author： Rizzo A.   Sagace M.   Galietti U.   Pappalettere C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.433, Iss.1, 2003-06, pp. : 144-148

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Growth of boron nitride thin films by metal-organic chemical vapour deposition

By Rao V.J.   Phani A.R.   Roy S.  

Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. : 21-25

Elsevier

Access to resources Recommend Favorite

Laser-assisted deposition of thin films from photoexcited vapour phases

By Conde O.   Silvestre A.J.  

Applied Physics A, Vol. 79, Iss. 3, 2004-08 ,pp. : 489-497

Springer Publishing Company

Access to resources Recommend Favorite

Chemical vapour deposition and characterization of gallium oxide thin films

By Battiston G.A.   Gerbasi R.   Porchia M.   Bertoncello R.   Caccavale F.  

Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. : 115-118

Elsevier

Access to resources Recommend Favorite

Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

By Aguas H.   Silva V.   Ferreira I.   Fortunato E.   Martins R.  

Philosophical Magazine B, Vol. 80, Iss. 4, 2000-04 ,pp. : 475-486

Taylor & Francis Ltd

Access to resources Recommend Favorite

A chemical vapour deposition route to MoO 3 -Bi 2 O 3 thin films

By Barreca D.   Rizzi G.A.   Tondello E.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 35-40

Elsevier

Access to resources Recommend Favorite