The characterization of structure-tailored plasma films deposited from the pulsed RF discharge

Author： Zhang J. Feng X. Xie H. Shi Y. Pu T. Guo Y.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 108-115

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