Detection by emission spectroscopy of active species in plasma-surface processes

By Ricard A.   Czerwiec T.   Belmonte T.   Bockel S.   Michel H.  

Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. : 1-8

Elsevier

Access to resources Recommend Favorite

Simulations of complex particle transport in heterogeneous active liquids

By Weihs Daphne   Teitell Michael   Mason Thomas  

Microfluidics and Nanofluidics, Vol. 3, Iss. 2, 2007-04 ,pp. : 227-237

Springer Publishing Company

Access to resources Recommend Favorite

On mechanisms of argon addition influence on etching rate in chlorine plasma

By Efremov A.M.   Kim D.-P.   Kim C.-I.  

Thin Solid Films, Vol. 435, Iss. 1, 2003-07 ,pp. : 232-237

Elsevier

Access to resources Recommend Favorite

Modeling plasma chemistry for microelectronics manufacturing

By Meeks E.   Ho P.  

Thin Solid Films, Vol. 365, Iss. 2, 2000-04 ,pp. : 334-347

Elsevier

Access to resources Recommend Favorite

A robust region-based active contour for object segmentation in heterogeneous case

By Aitfares W.   Bouyakhf E.   Regragui F.   Herbulot A.   Devy M.  

Pattern Recognition and Image Analysis, Vol. 24, Iss. 1, 2014-01 ,pp. : 24-35

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite