Diamond thick film deposition in wafer scale using single-cathode direct current plasma assisted chemical vapour deposition

Author: Lee W.-S.   Baik Y.-J.   Chae K.-W.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 89-94

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Abstract