Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH 3

Author: Elam J.W.   Schuisky M.   Ferguson J.D.   George S.M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.436, Iss.2, 2003-07, pp. : 145-156

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Abstract