Copper metallization of hydroxyl-modified amorphous Si:C:H films

Author: Pritchett M.   Magtoto N.   Tong J.   Kelber J.A.   Zhao X.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.440, Iss.1, 2003-09, pp. : 100-108

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Abstract