Author： Pflug A. Szyszka B. Niemann J.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.442, Iss.1, 2003-10, pp. : 21-26
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
VHF plasma processing for in-line deposition systems
By Rudiger J. Brechtel H. Kottwitz A. Kuske J. Stephan U.
Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. :
Access to resources
Recommend
Internal stress and adhesion of thin films sputtered onto glass by an in-line sputtering system
By Suzuki S.
Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. :
ITO coating by reactive magnetron sputtering-comparison of properties from DC and MF processing
Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. :
Longer line-up of in-line pumps
World Pumps, Vol. 1998, Iss. 382, 1998-07 ,pp. :