Author: Zeng K. Zhu F. Hu J. Shen L. Zhang K. Gong H.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.443, Iss.1, 2003-10, pp. : 60-65
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation
Thin Solid Films, Vol. 416, Iss. 1, 2002-09 ,pp. :
By Natsuhara H. Ohashi T. Ogawa S. Yoshida N. Itoh T. Nonomura S. Fukawa M. Sato K.
Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. :