Raman studies of aluminum induced microcrystallization of n + Si:H films produced by PECVD

Author： Rojas-Lopez M.   Gayou V.L.   Perez-Blanco R.E.   Torres-Jacome A.   Navarro-Contreras H.   Vidal M.A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.445, Iss.1, 2003-11, pp. : 32-37

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