Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering

Author： Hoshi Y.   Kato H.-o.   Funatsu K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.445, Iss.2, 2003-12, pp. : 245-250

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Structure and electrical properties of Pb(Zr,Ti)O 3 thin films deposited by reactive sputtering using multi-targets

By Cho N.-H.   Kim H.-G.  

Thin Solid Films, Vol. 266, Iss. 2, 1995-10 ,pp. : 140-144

Elsevier

Access to resources Recommend Favorite

Characterization of lead zirconate titanate thin films deposited at low temperature by reactive facing target sputtering

By Li X.-S.   Tanaka T.   Suzuki Y.  

Thin Solid Films, Vol. 375, Iss. 1, 2000-10 ,pp. : 267-270

Elsevier

Access to resources Recommend Favorite

Structure and Properties of W-Ti Thin Films Deposited by Magnetron Sputtering

By  

Materials Science Forum, Vol. 2016, Iss. 849, 2016-04 ,pp. : 654-658

Trans Tech Publications

Access to resources Recommend Favorite

Control of nano-structure of the initial growth layers of Co-Cr thin films deposited by facing targets sputtering

By Nakagawa S.   Naoe M.  

Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. : 595-599

Elsevier

Access to resources Recommend Favorite

Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering

By Meng L.-J.   Dos Santos M.P.  

Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. : 65-69

Elsevier

Access to resources Recommend Favorite