Computer simulation of film thickness distribution in symmetrical magnet magnetron sputtering

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.46, Iss.3, 1995-03, pp. : 229-232

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Simulation of the MO film deposition in the magnetron sputtering discharge

By Ishida M. Yamaguchi Y. Yamamura Y.

Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. : 225-229

Elsevier

Access to resources Recommend Favorite

Improvement of thickness distribution and crystallinity of ZnO thin films prepared by radio frequency planer magnetron sputtering

By Takeuchi M. Inoue K. Yoshino Y. Ohwada K.

Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. : 565-569

Elsevier

Access to resources Recommend Favorite

Numerical simulation of the characteristics of the different metallic species falling on the growing film in d.c. magnetron sputtering

By Malaurie A. Bessaudou A.

Thin Solid Films, Vol. 286, Iss. 1, 1996-09 ,pp. : 305-316

Elsevier

Access to resources Recommend Favorite

SiC film deposition by DC magnetron sputtering

By Gou L. Qi C. Ran J. Zheng C.

Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. : 42-44

Elsevier

Access to resources Recommend Favorite

Numerical simulation of the discharge in d.c. magnetron sputtering

By Shidoji E. Nakano N. Makabe T.

Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. : 37-41

Elsevier

Access to resources Recommend Favorite