Author: Shidoji E. Nakano N. Makabe T.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.351, Iss.1, 1999-08, pp. : 37-41
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Simulation of the MO film deposition in the magnetron sputtering discharge
By Ishida M. Yamaguchi Y. Yamamura Y.
Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. :
SiC film deposition by DC magnetron sputtering
By Gou L. Qi C. Ran J. Zheng C.
Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. :
Deposition of TiC films by dual source dc magnetron sputtering
By Inoue S. Wada Y. Koterazawa K.
Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. :