Modelling of the angular distribution of sputtered particles from roughened elemental and alloy targets

Author： Zhenxia W. Wenmin W. Wenyun L. Chuanshan W.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.47, Iss.12, 1996-12, pp. : 1465-1472

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