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Spectroscopic ellipsometry studies of buried CoSi 2 layers in Si formed by ion implantation with a metal vapor vacuum arc ion source

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Thin Solid Films, Vol. 375, Iss. 1, 2000-10 ,pp. : 280-283

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Erratum to ''Formation of CrSi 2 studied by Rutherford Backscattering Spectrometry'' [Vacuum 45(4) 421-422]

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