Deposition of polymeric nitrogenated amorphous carbon films (a-C:H:N) using electron cyclotron resonance CVD

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Thin Solid Films, Vol. 340, Iss. 1, 1999-02 ,pp. : 62-67

Elsevier

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High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

By Morrison N.A.   Rodil S.E.   Ferrari A.C.   Robertson J.   Milne W.I.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 71-73

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De-excitation mechanisms of Er 3+ in Er-doped hydrogenated amorphous silicon prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition

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Journal of Non-Crystalline Solids, Vol. 332, Iss. 1, 2003-12 ,pp. : 53-59

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Dielectric properties of molybdenum-containing diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition

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Thin Solid Films, Vol. 409, Iss. 2, 2002-04 ,pp. : 211-219

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Effect of process pressure on diamond-like carbon deposited using electron cyclotron resonance chemical vapor deposition

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Thin Solid Films, Vol. 396, Iss. 1, 2001-09 ,pp. : 62-68

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