Mechanisms for reactive DC magnetron sputtering of elements with different atomic masses: large area coatings of Al oxide and W oxide

By Olsson M.K.   Macak K.  

Thin Solid Films, Vol. 371, Iss. 1, 2000-08 ,pp. : 86-94

Elsevier

Access to resources Recommend Favorite

Aluminium nitride thin films deposited by DC reactive magnetron sputtering

By Dimitrova V.   Manova D.   Paskova T.   Uzunov T.   Ivanov N.   Dechev D.  

Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. : 161-164

Elsevier

Access to resources Recommend Favorite

Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering

By Meng L.-J.   Dos Santos M.P.   Azevedo A.  

Vacuum, Vol. 46, Iss. 3, 1995-03 ,pp. : 233-239

Elsevier

Access to resources Recommend Favorite

Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering

By Hotovy I.   Huran J.   Janik J.   Kobzev A.P.  

Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. : 157-160

Elsevier

Access to resources Recommend Favorite

Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide

By Muta M.   Ohgushi S.   Matsuda Y.   Fujiyama H.  

Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. : 221-224

Elsevier

Access to resources Recommend Favorite