Crystallographic and morphological characterization of reactively sputtered Ta, Ta-N and Ta-N-O thin films

By Stavrev M.   Fischer D.   Wenzel C.   Drescher K.   Mattern N.  

Thin Solid Films, Vol. 307, Iss. 1, 1997-10 ,pp. : 79-88

Elsevier

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Process monitoring and control of low temperature reactively sputtered AlN

By Kirkpatrick S.R.   Rohde S.L.   Mihut D.M.   Kurruppu M.L.   Swanson III J.R.   Thomson D.   Woollam J.A.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 16-20

Elsevier

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Microstructural and electrical characteristics of reactively sputtered Ta-N thin films

By Chang C.-C.   Jeng J.S.   Chen J.S.  

Thin Solid Films, Vol. 413, Iss. 1, 2002-06 ,pp. : 46-51

Elsevier

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Microstructure and crystallographic texture of reactively sputtered FeTaN films

By Klemmer T.J.   Inturi V.   Minor K.   Barnard J.   Thomas J.   Blachere J.  

Thin Solid Films, Vol. 353, Iss. 1, 1999-09 ,pp. : 16-19

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Low temperature growth of r.f. reactively planar magnetron-sputtered AlN films

By Penza M.   De Riccardis M.F.   Mirenghi L.   Tagliente M.A.   Verona E.  

Thin Solid Films, Vol. 259, Iss. 2, 1995-04 ,pp. : 154-162

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