Process monitoring and control of low temperature reactively sputtered AlN

Author： Kirkpatrick S.R.   Rohde S.L.   Mihut D.M.   Kurruppu M.L.   Swanson III J.R.   Thomson D.   Woollam J.A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.332, Iss.1, 1998-11, pp. : 16-20

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